04.11.16
AIXTRON SE announced that a new organic vapor phase deposition (OVPD) system of the company capable of handling 200x200 mm substrates has been installed and tested at Institut Lafayette. The installation of this custom built system marks a key milestone and moves Institut Lafayette, which is part of the Georgia Institute of Technology international campus in Metz, France, one step closer to its fully operational phase.
The newly tested OVPD cluster tool and the previously installed metal oxide chemical vapor phase deposition (MOCVD) tool constitute the two flagship semiconductor growth capabilities at Institut Lafayette. They complete the existing full set of tools covering all key enabling technologies necessary to the fabrication, testing and pre-production prototyping of optoelectronic devices that are housed in a 500 square meter clean room.
With its unique features, OVPD has the potential to alleviate the current limitations and concerns existing with conventional vacuum thermal evaporation (VTE). It could become the next-generation deposition technology for the large-scale, low-cost production of emerging organic electronic devices including organic light-emitting diodes (OLEDs) for displays and solid state lighting, and organic photovoltaic devices for renewable power generation.
AIXTRON’s showerhead technology used within the OVPD process has the advantage of being easily scalable as illustrated by the recent deposition results using the new Gen8 OVPD demonstrator that has been put into operation at AIXTRON’s headquarters in Herzogenrath, Germany.
“We have been very pleased with AIXTRON’s extensive support while commissioning, testing, and installing both our MOCVD and OVPD tools,” said Abdallah Ougazzaden, professor at the Georgia Institute of Technology and co-president of Institut Lafayette. “Based on this trustful relationship, we are confident that we will achieve our common objectives.”
“We are delighted to co-operate with an international research institution like Georgia Tech and its Institut Lafayette to support innovations in optoelectronics and advanced semiconductor materials research by providing our leading OVPD and MOCVD manufacturing equipment. We are looking forward to a vibrant partnership for further developing future-oriented and groundbreaking semiconductor technologies,” added Martin Goetzeler, CEO of AIXTRON SE.
“Reaching the operational phase with our OPVD tool is an important milestone for our newly-created innovation platform,” Bernard Kippelen, professor at the Georgia Institute of Technology and co-president of Institut Lafayette, commented. “Our teams and partners on both sides of the Atlantic have been working relentlessly to reach this point.”
The newly tested OVPD cluster tool and the previously installed metal oxide chemical vapor phase deposition (MOCVD) tool constitute the two flagship semiconductor growth capabilities at Institut Lafayette. They complete the existing full set of tools covering all key enabling technologies necessary to the fabrication, testing and pre-production prototyping of optoelectronic devices that are housed in a 500 square meter clean room.
With its unique features, OVPD has the potential to alleviate the current limitations and concerns existing with conventional vacuum thermal evaporation (VTE). It could become the next-generation deposition technology for the large-scale, low-cost production of emerging organic electronic devices including organic light-emitting diodes (OLEDs) for displays and solid state lighting, and organic photovoltaic devices for renewable power generation.
AIXTRON’s showerhead technology used within the OVPD process has the advantage of being easily scalable as illustrated by the recent deposition results using the new Gen8 OVPD demonstrator that has been put into operation at AIXTRON’s headquarters in Herzogenrath, Germany.
“We have been very pleased with AIXTRON’s extensive support while commissioning, testing, and installing both our MOCVD and OVPD tools,” said Abdallah Ougazzaden, professor at the Georgia Institute of Technology and co-president of Institut Lafayette. “Based on this trustful relationship, we are confident that we will achieve our common objectives.”
“We are delighted to co-operate with an international research institution like Georgia Tech and its Institut Lafayette to support innovations in optoelectronics and advanced semiconductor materials research by providing our leading OVPD and MOCVD manufacturing equipment. We are looking forward to a vibrant partnership for further developing future-oriented and groundbreaking semiconductor technologies,” added Martin Goetzeler, CEO of AIXTRON SE.
“Reaching the operational phase with our OPVD tool is an important milestone for our newly-created innovation platform,” Bernard Kippelen, professor at the Georgia Institute of Technology and co-president of Institut Lafayette, commented. “Our teams and partners on both sides of the Atlantic have been working relentlessly to reach this point.”
