For more than 40 years, SPIE has been regarded as the leading international event driving the future of lithography research and applications and continues to be the largest gathering of lithography experts in the world.
Join Brewer Science at the following sessions to learn more about technology innovation:
• Molecular force modeling of lithography – Zhimin Zhu, Brewer Science, Inc. (US).
• High-χblock copolymers for directed self-assembly patterning without the need for topcoat or solvent annealing - Kui Xu, Mary Ann J. Hockey, Richard Daugherty, Eric Calderas, Daniel Sweat, Jeffrey Fiehler, Michaela Veik, Brewer Science, Inc. (US).
• A track process for solvent annealing of high-χBCPs - Douglas J. Guerrero, Brewer Science, Inc. (Belgium); Harold W. Stokes, SCREEN SPE Germany GmbH (Germany); Xavier Chevalier, Arkema S.A. (France); Ahmed Gharbi, CEA-LETI (France); Kaumba Sakavuyi, Brewer Science, Inc. (US); Célia Nicolet, Arkema S.A. (France); Raluca Tiron, CEA-LETI (France); Kui Xu, Brewer Science, Inc. (US); Isabelle Servin, Laurent Pain, CEA-LETI (France).