The paper published by Nature Communications examines the development of new display photolithography technology that has overcome the limitations in realizing micron-resolution. The technology is expected to implement nanoscale-level patterns for high resolution images even with the current display facilities for photolithography and soft masks. It could also be applied to curved substrates, which raises hope for the technology to be used for various types of both LCD and OLED display production processes in the future.
"We expect that the newly-discovered photolithography technology in the research will serve as a seed technology to greatly contribute to advancing display technology in the future,” said Dr. Kiseok Chang from LG Display, co-author of the paper.
LG Display has been operating its ‘Incubation Program’ in collaboration with Yonsei University since 2015.
“The significance of this discovery lies in the fact that the technology can overcome the limits of the current photolithography process and can be utilized on both flat and curved substrates. We look forward to implementing this technology in various forms as well in the future,” said Professor Wooyoung Shim of Yonsei University.