05.12.15
JSR Corporation and imec signed a letter of intent to partner in enabling manufacturing and quality control of EUV lithography materials for the semiconductor industry. This partnership will be formalized by establishing a joint venture with imec as minority shareholder.
EUV lithography is considered as one of the main drivers to extend Moore’s law towards single digit nanometer technology nodes. Imec and JSR’s collaboration will allow both companies to leverage their strengths when developing photoresist solutions for the semiconductor industry.
JSR will provide manufacturing technology to the joint venture, including upgrading the facility at its wholly-owned subsidiary in Belgium, JSR Micro NV, by installing manufacturing and analytical equipment. Imec will provide expertise and services to the joint venture for quality control on materials. In addition to the manufacturing of JSR brand photoresists, the joint venture will offer toll-manufacturing capability to other material suppliers with confidentiality secured.
“The partnership enabled through close proximity between the JSR manufacturing facility and the imec technology platform will allow our partners to gain access to best-in-class materials for next-generation technologies,” said Luc Van den hove, president and CEO at imec.
“JSR has successfully developed not only chemically amplified photoresists, but also newly designed chemistries with very high sensitivity and good productivity,” said Nobu Koshiba, president of JSR Corporation. “The industry is requesting material suppliers to prepare manufacturing infrastructure and quality control capabilities for defect-free lithography solutions, as well as to improve photoresist performance to match EUV exposure equipment. It is by knowing those industry needs and requirements very well, that we, two world leading organizations that have supported the semiconductor industry for a long time, come to this unique idea to form a manufacturing joint venture to support those future industry needs.”
EUV lithography is considered as one of the main drivers to extend Moore’s law towards single digit nanometer technology nodes. Imec and JSR’s collaboration will allow both companies to leverage their strengths when developing photoresist solutions for the semiconductor industry.
JSR will provide manufacturing technology to the joint venture, including upgrading the facility at its wholly-owned subsidiary in Belgium, JSR Micro NV, by installing manufacturing and analytical equipment. Imec will provide expertise and services to the joint venture for quality control on materials. In addition to the manufacturing of JSR brand photoresists, the joint venture will offer toll-manufacturing capability to other material suppliers with confidentiality secured.
“The partnership enabled through close proximity between the JSR manufacturing facility and the imec technology platform will allow our partners to gain access to best-in-class materials for next-generation technologies,” said Luc Van den hove, president and CEO at imec.
“JSR has successfully developed not only chemically amplified photoresists, but also newly designed chemistries with very high sensitivity and good productivity,” said Nobu Koshiba, president of JSR Corporation. “The industry is requesting material suppliers to prepare manufacturing infrastructure and quality control capabilities for defect-free lithography solutions, as well as to improve photoresist performance to match EUV exposure equipment. It is by knowing those industry needs and requirements very well, that we, two world leading organizations that have supported the semiconductor industry for a long time, come to this unique idea to form a manufacturing joint venture to support those future industry needs.”