Trefonas is one of 83 new members and 16 foreign members nominated by their peers to be elected to the Academy this year. The newly elected class was inducted on Sept. 30 in a formal ceremony at the NAE Annual Meeting in Washington, D.C.
The Academy recognizes engineers who have made significant contributions to “engineering research, practice or education; pioneering new and developing fields of technology; making major advancements in traditional fields of engineering, or developing and/or implementing innovative approaches to engineering education.”
Trefonas was recognized for his significant inventions in photoresist materials and microlithography methods that underpin multiple generations of semiconductor manufacturing processes.
“I am truly appreciative of my peers who nominated me to the Academy, and am honored to join the ranks of this accomplished group,” said Trefonas. “I also thank my colleagues with whom I have collaborated on much of my research, as they have greatly contributed to the work being recognized by the Academy.”
Trefonas’ career in the microelectronics industry has been fundamental to many of the inventions that enable semiconductor manufacturing today. He currently holds 88 US patents related to lithographic materials and processes, anti-reflective coatings, block copolymers, displays, dyes, OLEDs, photonics, and nanomaterials.
A recognized author and speaker, Trefonas has been the recipient of the American Chemical Society’s Heroes of Chemistry Award in 2014, and the Society of Chemical Industry Perkin Medal in 2016.
Earlier in 2018, he was named a Fellow of SPIE, the international society for optics and photonics.
“Trefonas’ accomplishments and the number of innovations resulting from his research have left an incredible impact on our business and our customers,” said Cathie Markham, global R&D director for DuPont Electronics & Imaging. “He continually inspires our research and engineering teams to develop novel solutions to address industry challenges and consider new possibilities. We congratulate him on this outstanding recognition.”
Among his numerous achievements in semiconductor lithography, Trefonas helped bring to market the first i-line photoresist product and safe-solvent photoresist offerings, and led projects in 193nm and 248nm photoresist formulations as well as organic bottom anti-reflectant coating formulations.