BluGlass selected the AIX 2800G4-HT system for the scaling of RPCVD to mass production capacities. AIXTRON’s Planetary Reactor delivers class-leading semiconductor film uniformity due to its proprietary dual axis of wafer rotation during deposition. RPCVD technology enables low-temperature deposition of III-V nitrides which could potentially improve the performance of devices. The first integration of RPCVD onto the AIX 2800G4-HT will be conducted at BluGlass’ Silverwater facility in Sydney, Australia.
“This is an important step towards demonstrating the commercial viability of RPCVD in large-scale manufacturing,” BluGlass Managing Director Giles Bourne said.
“At AIXTRON, we are constantly striving to bring novel technologies onto our platforms in order to provide our customers with advanced capabilities. We want to explore the potential of RPCVD technology for low-temperature deposition of nitride layers which may open up new possibilities for optoelectronic devices,” added AIXTRON’s Group Innovation Officer Dr. Ken Teo.